Organic contamination control in cleanrooms – WOS ATD GCMS

TERA Environnement has been specialized in clean room contamination control for over 20 years!

What are the sources of contamination in cleanrooms?

Cleanrooms can be contaminated by organic compounds resulting from construction or manufacturing through building materials, consumables, gases and other sources.

Detection & characterization

DETECTION: Setup of wafers to monitor air contamination in a cleanroom
CHARACTERIZATION: Characterization of contamination to identify its source

Why is it important to control organic contamination in cleanrooms?

Process optimization & cost reduction

By identifying contaminants, the manufacturing processes are optimized, defects are reduced, and product performance is improved.
By detecting and eliminating organic contaminants, high costs associated with production defects and product returns are avoided.

TERA Environnement’s 3-step laboratory approach

1- Samples processing

6-, 8- or 12-inches silicon wafers that were exposed in a cleanroom for 1 to 7 days can be handled by this method.

2- Wafer Outgassing System (WOS)

A single wafer is laid flat on the WOS.

High-temperature heating as well as gas circulating in the WOS allow molecules collected on the wafer surface during the cleanroom exposure to be outgassed.

OUTGASSED COMPOUNDS are collected in a thermodesorption tube.

3- Outgassed compounds analyzed with ATD GC MS

COMPOUNDS ANALYZED: Organophosphates, Phthalates, Siloxanes, Screening of major compounds.

PRECISE DETECTION AT VERY LOW LEVELS: from 0,01 to 0,1 ng/cm² ensuring reliable detection of impurities.

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To find out more, have a look at our services for cleanroom air analysis, surface contamination and outgassing measurements.

Do you have any questions or do you need a quote? Contact us to find out more about our analysis services.

Organic contamination control in cleanrooms – WOS ATD GCMS

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